Product name | PECVD Chemical Vapor Deposition System |
Product model | CY-PECVD-500T-SS |
Power supply | AC220V 50Hz |
RF Power | Signal frequency | 13.56MHz |
Power output range | 0~300W |
Maximum reflected power | 100W |
Reflected power (at maximum power) | <5W |
Power stability | ±0.1% |
Working chamber | Heating temperature | RT-400℃ |
Temperature control accuracy | ±1℃ |
Sample stage size | Φ200mm |
Sample stage speed | 1-20rpm adjustable |
Nozzle size | Φ200mm |
Distance | The distance between the nozzle and the sample is 40-100mm continuously adjustable |
Deposition working vacuum | 0. 133- 133Pa (adjustable according to the process) |
Flange | The upper cover design makes the substrate easy to replace and has a visual window |
Cavity | Stainless steel material, Φ500mm * 500mm |
Observation window | Φ40mm |
Gas supply system | Number of channels | Customized |
Measurement unit | Mass flow meter |
Measuring range | A channel: 0～200SCCM for H2 |
B channel: 0～200SCCM for CH4 |
C channel: 0～200SCCM for C2H4 |
D channel: 0～500SCCM for N2 |
E channel: 0～500SCCM for NH3 |
F channel: 0～500SCCM for Ar |
Measurement accuracy | ±1.5%F.S |
Working pressure difference | -0.15Mpa~0.15Mpa |
Connecting pipe material | 304 stainless steel |
Gas path | 304 stainless steel needle valve |
Inlet and outlet interface specifications | 1/4" ferrule fitting |
Vacuum system | Pre-stage pump pumping speed | 4.7L/s |
Molecular pump pumping speed | 60L/s |
Vacuum measurement | Compound vacuum gauge, range 10-5Pa ~ 105Pa |
Vacuum degree | 5.0*10-3Pa |
Water Cooler | Cooling water temperature | ≦37℃ |
Water flow rate | 10L/min |
Power | 0.1KW |
Cooling power | 50W/℃ |
Air compressor | OTS-550 |
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Product size | 1362*736*1434 |
Product weight | 280公斤 |
