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Perelin true air facies depositionPerelin true air facies depositionPerelin true air facies depositionPerelin true air facies depositionPerelin true air facies deposition

Perelin true air facies deposition

    Perelin true Air Phase deposition (PECVD) is a commonly used thin film deposition technique for preparing thin films on the surface of a  material. It is the process of depositing a thin film in a vacuum environment using a vapor phase chemical reaction. In Perelin true air phase deposition, a vacuum environment needs to be established first to ensure that there is no gas interference during  deposition.  Then,  by  introducing  the  gas  into the  reaction  chamber,  it  reacts  with the surface and is deposited to form a film

Perelin true Air Phase deposition (PECVD) is a commonly used thin film deposition technique for preparing thin films on the surface of a  material. It is the process of depositing a thin film in a vacuum environment using a vapor phase chemical reaction. In Perelin true air phase deposition, a vacuum environment needs to be established first to ensure that there is no gas interference during  deposition.  Then,  by  introducing  the  gas  into the  reaction  chamber,  it  reacts  with the surface and is deposited to form a film.

 

Perelin true air phase deposition can be used to prepare various different types of films such as silicon  nitride,   silicon  oxide,  aluminum  nitride,  etc.  It  has  a  wide   range  of  applications   in semiconductor, optoelectronics, display devices and other fields, and can be used to prepare thin film resistors, optical coatings, heat insulation, etc.

 

Pirelin true  air  phase  deposition  has  some  advantages,  such  as  fast  deposition  speed,  good deposition  uniformity and strong  controllability.  However,  it  also  has  some  limitations, such as the inability to deposit a large area of thin film and the need for a high vacuum environment.

 

Overall,  Perelin true air  phase deposition is  an important film preparation technique  that can provide high quality film materials in a variety of applications.

 

Parameters of Perelin true air deposition equipment: 

 

Device name

Perelin true air phase deposition   equipment

Product Model

CY-VPC-300

Work environment

Power supply: 380V five-wire       4 square   cable, maximum power  l0KW

Ambient temperature: 0-40

Ambient humidity: < 90%

Size

The appearance size is1580*880*1550mm,covers an   area of about 1.5 square meters, and there should be more than   50cm operating space around the installation

Heating part

Sublimation area

Raw material  bin: φ69*200mm    Capacity :300g

Evaporation temperature: room temperature   200

Temperature deviation :±2

Cracking    Zone

Cracking temperature :650-7Temperature stability: ± 2

Insulation area

Heating temperature < 300 

Control system

Branding

PLC control system

Program

There are two parts for automatic   deposition system and manual deposition system

Display

Display size :12 "touch  color   screen

Depositional system

Vacuum

substrate

1, size φ300xH400, 304 stainless steel

Chamber

28L

Observation window

1,viewing window for easy   observation of the condition of the  product in  the deposition chamber

Rotating section

Motor speed adjustable 1-10 RPM

Refrigeration system

ColdTH-95-15-G(pottype),refrigeration temperature ≤90within30 minutes after starting refrigeration   can be from room temperature to -70 

Coupling  agent evaporation device

Improve the adhesion of the  perelin   coating to the surface of the substrate to be coated

Main  parts  of equipment

1, evaporation system:  evaporation   chamber,electric power  n heat device, temperature sensor

2, cracking system: cracking chamber,   electric thermal device, temperature sensor

3, deposition system: deposition chamber,   vacuum sensor, sample rack 4, vacuum system:  vacuum pump, vacuum gauge

5, condensing system: pot  type cold   trap

6, equipment host: equipment  shell,   control circuit, vacuum pipe 7, quartz tube: 1

Sedimentable raw material type

Parylene C, N, F, D

Equipment Features

1, the gasification heating can be   moved, suitable for continuous  production,    such as   sudden power failure and other unexpected circumstances can be removed at   anytime to ensure product safety.

2,   the gasification part is a   transparent glass tube, which  can  be viewed at any time, and can   maintain low temperature production to meet the high  requirements of   coating.

3,   gasification can be   moved,  is to send the  patent setting,   can ensure  no   patent conflict, production safety.

4.  The  special    design  of  the internal rotating  frame  of the    cavity can effectively reduce the number of bad  points.

5. Visual and humanized interface, easy   to understand operation. 
   6, glass tube,can greatly reduce the heating and cooling time.

7.   The insulation part is    optimized, so  that Perelin is not easy  to deposit in the inner   wall of  the glass tube,  which can be maintained for a  long   time and reduce the maintenance time

 


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  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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