This three-target magnetron sputtering coating instrument, independently developed by Zhengzhou CY Scientific Instrument Co., Ltd., is a high-vacuum thin film deposition equipment equipped with three independent sputtering targets. Adopting DC/RF magnetron sputtering technology, under high vacuum environment, high-energy plasma bombards the target material, sputtering target atoms onto the substrate surface to form uniform and dense thin films. Integrated with independent target power supplies, high-precision vacuum system and intelligent touch control system, it supports multi-element co-sputtering and sequential sputtering, capable of preparing various thin films including metals, semiconductors and oxides. It is an ideal device for laboratory scientific research and small-batch sample coating.
1.Product Functions
Three-target independent sputtering: 3 target positions can be controlled separately, supporting single-target sputtering, sequential sputtering and co-sputtering to fabricate single-layer films, multi-layer films and composite alloy films.
Multiple sputtering modes: Compatible with DC direct current sputtering and RF radio frequency sputtering, suitable for metal targets and insulating oxide targets.
High-precision vacuum control: Vacuum unit composed of mechanical pump and molecular pump, high-vacuum chamber to reduce film impurities and improve film quality.
Substrate temperature control & rotation: Sample stage supports heating / water cooling, samples rotate at constant speed to guarantee film thickness uniformity.
Intelligent touch control system: Dual control by industrial computer and touch screen, real-time monitoring of vacuum, power, temperature and coating time, storage of coating process recipes.
Precise gas flow regulation: Mass flow controllers (MFC) control process gas such as argon and oxygen for controllable atmosphere to prepare oxide thin films.
Safety interlock protection: Vacuum interlock, overload, water shortage and emergency stop protection to ensure equipment and personal safety.
2.Application Fields
University & research institute labs: Thin film research for materials science, semiconductors, optics and new energy
Semiconductor industry: Deposition of metal electrode films, conductive films and passivation layers
Optical industry: Optical anti-reflection coatings, reflective films and filter coatings
New energy: Perovskite solar cells, thin-film batteries, electrode films and catalytic films
Surface engineering: Sample surface modification, wear-resistant and anti-corrosion coatings
MEMS & sensors: Fabrication of functional sensitive thin films
3.Technical Parameters
Product Name | Three Target Magnetron Sputtering Coater |
Product Model | CY-MSZ273-III-DCDCRF-SS |
Target Quantity | 3 targets (DC/RF combination customizable) |
Standard Target Size | 2 inch (1/3 inch, 4 inch optional) |
Sputtering Power Supply | DC power supply / RF power supply, power 0~500W per channel adjustable |
Vacuum System | Mechanical pump + molecular pump set |
Ultimate Vacuum | ≤5×10⁻⁴ Pa |
Working Vacuum | 1~10 Pa |
Sample Stage Diameter | φ100mm (larger size customizable) |
Sample Stage Function | Constant speed rotation, optional heating (RT~500℃) or water cooling |
Process Gas | Ar, O₂, N₂, etc., equipped with high-precision MFC mass flow meters |
Chamber Material | 304 stainless steel vacuum chamber with viewing window |
Control System | Industrial PC + touch screen, automatic process programming & data recording |
Overall Dimension | Approx. 700×800×1600 mm (with casters) |
Power Supply | AC220V, 50Hz |
Cooling System | Circulating chiller (optional) |
5.Core Advantages
Independent control of three targets, flexible process switching, can prepare multi-layer and alloy composite thin films, multi-purpose in one machine.
High-vacuum stainless steel chamber with low leakage rate, high film purity, dense and uniform coating.
Modular design, target materials, power supplies and sample stage can be customized on demand.
Visual coating observation window to directly view the coating process.
Full automatic process recording for convenient data traceability for research papers.
Complete safety protection, emergency stop button and vacuum interlock for safe operation.
6.FAQ
Q1: What types of target materials are supported?
A: Metal targets (Cu, Al, Au, Ti), ceramic oxide targets (ITO, ZnO, Al₂O₃). DC is suitable for metals, RF for insulating targets.
Q2: What is the maximum sample size?
A: Standard φ100mm sample stage, larger sample base can be customized.
Q3: Can three targets work simultaneously for co-sputtering?
A: Yes. The three target power supplies can adjust power independently to realize co-sputtering for alloy thin films.
Q4: Does the equipment include a water chiller?
A: The chiller is optional. It is recommended to equip a circulating chiller when the target works under high power sputtering.
