TWO-target DC RF Magnetron Sputtering Coater

TWO-target DC RF Magnetron Sputtering Coater

This equipment is Two targets DC RF magnetron sputtering coater apparatus, which is for the preparation of metal thin films and nonmetal films. It has applications in the fields of electronics, optics, and special ceramic preparation.

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The 2 target magnetron sputtering coater is equipped with 2 four inches 100mm OD target guns: Two target gun is equipped with 1 RF power supply for sputtering coating of non-conductive targets; with 1DC power independent control coating all metal target, it also can be used to coat multi layer conductive metal films.

Magnetron sputtering coater TECHNICAL PARAMETER

DC RF magnetron sputtering system	TWO-target DC RF Magnetron Sputtering Coater
Model No.	CY-MSP500S-DCRF
Working Voltage	VAC 220, 50Hz
Sputtering Vacuum Chamber	Dimension: D500X500 Material: 304 stainless steel Inner wall processing: electrolytic polishing Viewport (window): ~4'' (100mm) with shutter Opening methods: Open from front, Target gun on top or under Double water chiller layer
Sample Holder	Sample holder: Dia. 150 mm Rotary speed: 1~20rpm adjustable Heating temperature: RT~ 500℃ Coating distance:50-100mm adjustable
Target position	Up or down (based on customer need)
Magnetron Sputtering Gun	Quantity: 2 sets 1RF+1DC equipped with baffle Adjustable angle -60° ~ 60° Target dimension: diameter 4'' Target thickness: max.6mm Target plane: circular plane target Glow vacuum:10pa~0.2Pa Target utilization rate: about 40%
DC power	Quantity: 1 set Output power: 1000W
RF power supply	Quantity: 1 set Output power: 0~500W RF frequency: 13.56 MHz Matching method: automatch Reflected power: ≦100W（After matching, the reflected power is 0） Power stability: ±0.1% Rf output connector: N model connector Overall efficiency ≥75% Harmonic component≦-50dBc Type of cooling: Forced-air Usage environment temp: -10℃-40℃
Vacuum System	Backing Pump	Double-stage rotary vane pump Pumping rate: 4.4L/s
	Molecular Pump	Pumping rate: 1200 L/s Vacuum degree: 5*10-4Pa
	Composite Vacuum Gauge	Resistance gauge + ionization gauge Measuring range: 10-5Pa ~ 105 Pa
Water Cooler	Temperature control range: 10℃ ~ 25℃ Nominal cooling capacity: 0. 75KW Flow rate: 10L/min Cooling water: purified water
CY-100 Film Thickness Measurement and Control Instrument	Basic Configuration: 4 channels of crystal signal input, 4 channels of control signal output, equipped with a 7-inch display screen. Core Chip: Adopts CPLD and equal-precision measurement technology. Crystal Frequency Detection Range: 5 MHz ~ 6 MHz; full-scale resolution: 0.12 Hz. Control Signal Output: 4–20 mA, resolution accuracy better than 0.1%, with strong anti-interference capability. Basic Display Parameters: Crystal frequency, film thickness, deposition rate and crystal lifetime. Built-in Parameters: Preloaded with more than 250 sets of parameters for commonly used materials. Film Layer Planning: Supports up to 3000 coating layers.
Mass Flow Controller	Two-channel MFC Ar gas: range 0-500sccm O2：range 0-500ccm (Precision 1%）
Control	PLC automatic control: 14.3 " touch screen Operation interface: inch touch screen + operation interface Automatic control process: The entire process from vacuuming to coating. It can store process formulas and import and export experimental records, and can be configured with a host computer interface for easy remote control. The program is independently developed and can achieve fully automatic coating control.
Valve	Electronically controlled pneumatic gate valve Electrically controlled pneumatic cut-off valve Electrically controlled pneumatic side drain valve
Air compressor	Operates on three pneumatic valves Rotating speed: 1380r/min Flow: 40L/min Rated discharge pressure: 0. 7Mpa