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Roll to Roll Ion Beam Assisted Deposition System for High Temperature Superconducting TapeRoll to Roll Ion Beam Assisted Deposition System for High Temperature Superconducting TapeRoll to Roll Ion Beam Assisted Deposition System for High Temperature Superconducting TapeRoll to Roll Ion Beam Assisted Deposition System for High Temperature Superconducting TapeRoll to Roll Ion Beam Assisted Deposition System for High Temperature Superconducting Tape

Roll to Roll Ion Beam Assisted Deposition System for High Temperature Superconducting Tape

    The Roll‑to‑Roll Ion Beam Assisted Deposition System for High‑Temperature Superconducting Tape (hereinafter referred to as “this system”) is a professional thin‑film deposition equipment for buffer‑layer fabrication of second‑generation high‑temperature superconducting tapes (REBCO coated conductors)

1. Product Introduction

The Roll‑to‑Roll Ion Beam Assisted Deposition System for High‑Temperature Superconducting Tape (hereinafter referred to as “this system”) is a professional thin‑film deposition equipment for buffer‑layer fabrication of second‑generation high‑temperature superconducting tapes (REBCO coated conductors).

Adopting roll‑to‑roll continuous tape transportation mode, metal substrates (e.g. Hastelloy C276 alloy tape or stainless steel tape) travel continuously inside the vacuum chamber. With the Ion Beam Assisted Deposition (IBAD) process, biaxially textured MgO template layers are deposited on substrate surfaces, providing crystallographic orientation foundation for subsequent epitaxial growth of buffer layers such as LaMnO₃, CeO₂ and superconducting layers.

Integrated with IBAD deposition unit, roll‑to‑roll transport unit, vacuum & temperature‑control unit and automatic control unit, this system features continuous operation, high automation and excellent repeatability. It serves as key process equipment for mass production of superconducting tapes.

2. Application Fields

  1. Fabrication of buffer layers for second‑generation high‑temperature superconducting tapes (REBCO coated conductors), building biaxial texture foundation for epitaxial growth of superconducting layers.

  2. Preparation of tape substrates for superconducting devices including superconducting cables, superconducting magnets and superconducting motors.

  3. Supply of superconducting tapes for high‑magnetic‑field applications such as Magnetic Resonance Imaging (MRI), particle accelerators and fusion devices.

  4. Preparation and research of high‑performance biaxially textured thin films, including textured functional films of MgO, LaMnO₃, CeO₂, etc.

  5. Research on material preparation processes such as surface texturing treatment of metal substrates and continuous deposition of functional thin films.

3. Core Advantages

  1. Continuous Roll‑to‑Roll Process: Integrated unwinding & rewinding for continuous tape travel, high tape utilization rate, suitable for large‑scale continuous production.

  2. Controllable Biaxial Texture: Precisely adjustable ion beam energy, beam current density and incident angle to obtain high‑orientation IBAD‑MgO template layers.

  3. Closed‑loop Tension Control: Real‑time closed‑loop tension adjustment ensures stable tape running and high deposition uniformity.

  4. Modular Chamber Design: Modular layout of unwinding, deposition and rewinding chambers, compatible with extended processes for multiple buffer‑layer deposition.

  5. High‑level Automation: Combined PLC and industrial PC with touch‑screen HMI; programmable and traceable process parameters.

4. Technical Parameters

Product NameRoll‑to‑Roll Ion Beam Assisted Deposition System for High‑Temperature Superconducting Tape
ModelCY‑MSH‑IBAD
Tape Width10~50 mm (customizable)
Tape Thickness50~100 μm
Substrate MaterialHastelloy C276 / 316L Stainless Steel
Tape Travel Speed0.5~20 m/h
Unwinding / Rewinding Reel Diameter≤Φ400 mm
Ion Source TypeKaufman‑type / Hall‑effect RF Ion Source
Ion Beam Energy100~1200 eV
Ion Beam Current0~100 mA
Ion Beam Incident AngleAdjustable from 0° to 60°
Deposition SourceElectron‑beam Evaporation Source / Magnetron Sputtering Source
Deposition Rate0.01~1 nm/s
Base Vacuum≤5×10⁻⁵ Pa
Working Vacuum1×10⁻³~1×10⁻² Pa
Substrate Heating TemperatureRoom Temperature (RT) ~ 500 ℃
Tension ControlClosed‑loop control, 0.1~20 N
Control SystemPLC + Industrial PC, Touch‑screen HMI
Total Installed PowerApprox. 30~80 kW
Chamber ConfigurationMulti‑chamber Modular (Unwinding / Deposition / Rewinding)



Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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